Zinc bis(trifluoromethylsulfonyl)imide, >98%
$112.20 – $1,171.50Price range: $112.20 through $1,171.50
Product Code: KI-0062-HPCAS NO: 168106-25-0
- Chemical Formula: C4F12N2O8S4Zn
- Synonyms: Zn (BTA)2
**This product will incur a $97.00 HazMat fee when the order is placed.**
SUM Formula: C4F12N2O8S4Zn
Molecular Weight: 625.68
Purity: >98%
- SUM Formula: C4F12N2O8S4Zn
- Molecular Weight: 625.68
Zinc bis(trifluoromethylsulfonyl)imide, CAS: 168106-25-0
Key Applications:
Electrolyte development for zincโbased batteries
Used as a highโconductivity zinc salt in aqueous, organic, and ionicโliquid electrolyte systems. The weakly coordinating TFSIโป anion supports wide electrochemical stability windows, enhanced ion mobility, and reduced dendrite formation in zincโion and hybrid multivalent batteries.
Supercapacitors and hybrid energyโstorage devices
Serves as a charge carrier in highโvoltage supercapacitor electrolytes, enabling improved cycling stability and tunable ionic transport in organic and ionicโliquid media.
Electrodeposition and surface engineering
Facilitates controlled zinc electrodeposition with smoother morphology and reduced passivation. Applied in research on corrosionโresistant coatings, thinโfilm growth, and mechanistic studies of metal nucleation and interfacial behavior.
Ionic liquid and deep eutectic solvent formulation
Acts as a metalโcentered component in the synthesis of taskโspecific ionic liquids and eutectic systems. The TFSIโป counterion enables low viscosity, high conductivity, and broad solvent compatibility for catalysis, separations, and electrochemical media.
Lewis acid catalysis and organic synthesis
Functions as a nonโnucleophilic Lewis acid suitable for activating oxygenโ, nitrogenโ, and sulfurโcontaining substrates. Its high solubility in lowโpolarity solvents and chemically inert anion minimize side reactions in polymerization and fineโchemical transformations.
Materials processing and thinโfilm research
Used as a precursor or dopant in polymer modification, vaporโphase deposition studies, and ionโexchange processes. Supports investigations into dielectric behavior, ion transport, and interfacial stability in soft materials and functional films.
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