1-Methyl-3-octylimidazolium hexafluorophosphate, CAS: 244193-50-8

Key Applications:

Extraction & Separation Processes

• Serves as a hydrophobic ionic liquid phase for liquid–liquid extraction of metal ions, aromatic hydrocarbons, dyes, and bioactive compounds.
• Enables selective partitioning due to its long alkyl chain and low miscibility with water.
• Used in supported ionic liquid membranes (SILMs) for gas separation and organic vapor transport.

Electrochemical Systems

• Functions as a non‑volatile electrolyte or electrolyte additive in supercapacitors and electrochemical cells.
• High electrochemical stability window supports high‑voltage applications.
• Useful in ionic liquid–based reference electrodes and electrodeposition baths for metals and semiconductors.

Catalysis & Reaction Media

• Acts as a non‑coordinating, thermally stable solvent for acid‑sensitive or moisture‑sensitive reactions.
• Supports transition‑metal catalysis, including hydrogenation, oxidation, and C–C coupling.
• Enhances reaction rates in biphasic catalytic systems due to tunable polarity and hydrophobicity.

Biomass Processing & Green Chemistry

• Applied in pretreatment of lignocellulosic biomass, improving dissolution of lignin and hemicellulose.
• Serves as a recyclable medium for biocatalysis, including lipase‑catalyzed esterification and transesterification.

Surfactant & Self‑Assembly Studies

• Long C8 chain promotes micelle formation, interfacial structuring, and self‑assembly behavior.
• Used in studies of colloidal stabilization, nanoparticle dispersion, and interfacial charge transfer.

Nanomaterials & Advanced Materials

• Template and stabilizer for nanoparticle synthesis (Au, Ag, Pt, metal oxides).
• Employed in polymer–ionic liquid composites to enhance conductivity, mechanical strength, and thermal stability.
• Useful in ionic liquid gels and ionogels for flexible electronics.

Thermal & Chemical Stability Applications

• High thermal stability makes it suitable for heat‑transfer fluids and high‑temperature reaction media.
• Low vapor pressure supports vacuum‑compatible processes.

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